Placement of Nitrogen-Vacancy-Centers in Diamond Through Chemical Vapor Deposition Growth Techniques

Citation: Schätzle, Philip, Nicola Lang, and Peter Knittel. “Placement of Nitrogen‐Vacancy‐Centers in Diamond Through Chemical Vapor Deposition Growth Techniques.” physica status solidi (a) (2025): e202500730.

Authors: Philip Schätzle, Nicola Lang & Peter Knittel

Publication location: Physica status solidi (a) – Wiley Online Library

Date: 2025

DOI:  https://doi.org/10.1002/pssa.202500730

Abstract:

The positioning of nitrogen-vacancy (NV) centers is critical for quantum technologies such as quantum sensing and computing. NV incorporation during chemical vapor deposition growth can provide a defect-free, well-controlled environment, yielding high spin-coherence times and stable color centers. Various reactor designs that allow for controlled gas-switching have been developed, and process conditions have been optimized to achieve low growth rates, enabling placement of single NV centers or NV ensembles during growth or post-growth at defined depths and in specified regions. This is primarily achieved by fabricating delta-doped layers—nanoscale-thick dopant layers within the diamond. In addition to using the as-grown layers, these structures can be further processed by lithography or implantation methods to laterally position NV centers at a defined depth, even in complex diamond structures. Under suitable growth conditions, NV centers can also be positioned on prepatterned microstructures by preferentially forming delta-doped layers on defined facets. For lateral positioning on flat surfaces, a similar approach can localize NVs. This article describes and compares these methods and outlines future perspectives in the context of quantum technologies.

(a) Schematic of the CVD reactor. (1) Load-lock chamber with horizontal transfer, (2) vertical substrate lift, (3) substrate holder with heater, (4) microwave generator, (5) aluminum ellipsoid, and (6) quartz bell jar. Dimensions are not to scale. (b) Enlarged view of the marked area in (a), showing a sample in the retracted position and in the plasma. Reproduced under terms of the CC-BY license [19]. Copyright 2023, The Authors, published by Wiley-VCH. (c) SIMS-profile of a delta-doped layer, that was grown using the presented reactor. The nitrogen concentration shows a sharp peak with a width of 2 nm [70]. Reproduced under terms of the CC-BY license 2025.

Share on

Share on

High Coherence Times in NV-Doped Diamond Films for Quantum Sensing

Placement of Nitrogen-Vacancy-Centers in Diamond Through Chemical Vapor Deposition Growth Techniques

Enhancing NV concentration in delta-doped diamond via low-pressure high-temperature annealing

High Coherence Times in NV-Doped Diamond Films for Quantum Sensing

Placement of Nitrogen-Vacancy-Centers in Diamond Through Chemical Vapor Deposition Growth Techniques

Discover more

All news, events, publications and much more…

Amadeus Project
Privacy policy summary

We use cookies to provide and secure our Website as well to differentiate between users and sessions, distinguish users, improve user experience according to its preferences or to identify the origin of the user account. To learn more about our use of cookies see our Privacy Statement. You can find out more about which cookies we are using or switch them off in settings.