Enhancing NV concentration in delta-doped diamond via low-pressure high-temperature annealing

Citation: Schätzle, Philip, et al. “Enhancing NV concentration in delta-doped diamond via low-pressure high-temperature annealing.” Diamond and Related Materials (2026): 113337.

Authors: Philip Schätzle; Sven Mägdefessel; Leon Büttner; Patrik Straňák; Aurelién Commans; Lutz Kirste; Rebekka Eberle; Volker Cimalla; Peter Knittel

Publication location: Diamond & Related Materials (Elsevier, ScienceDirect)

Date: 16 January 2026

DOI: https://doi.org/10.1016/j.diamond.2026.113337

Abstract:

We present the increase in the nitrogen vacancy center concentration in nitrogen delta-doped layers by almost one order of magnitude. To achieve this, we employ a low-pressure, high-temperature annealing step at 1750 °C in vacuum. We demonstrate an enhancement of the photoluminescence intensity of NV centers compared to annealing steps at lower temperatures of 1200 °C. To achieve this, we fabricate nitrogen-doped thin films with a thickness of 50 nm via chemical vapor deposition. We show that the nitrogen is mainly incorporated in a 6 nm thin film at the layer interface. We link the strong enhancement of the NV concentration to a possible decomposition of NVH centers and the mobility of various species at elevated temperatures, including vacancies and nitrogen in these two-dimensional structures. Additionally, after the high temperature annealing, we observe a Hahn-echo spin coherence time of 7.9 µs, which is in line with literature data on achievable coherence time in highly nitrogen-doped layers. Our results could pave the way for the precise fabrication of improved diamond elements, e.g., used in magnetic field sensors and offer an alternative route to implantation techniques.Schätzle, Philip, et al. “Enhancing NV concentration in delta-doped diamond via low-pressure high-temperature annealing.” Diamond and Related Materials (2026): 11333 .

Fig. (a) The depth slice through the as-grown sample S1 reveals low emission at the NV zero phonon line (637 nm) compared to the Raman peak (574 nm). (b) The same measurement performed on sample S3 after a low temperature anneal (1200 °C for 4 h). The emission with respect to the Raman peak is slightly increased. (c) Depth slice through the sample S1 after LPHT anneal (1750 °C for 30 min) leads to significantly stronger emission. (d) Representative spectra obtained from bright spots in (a) to (c), showing the increase of the PL intensity after the LPHT annealing. The spectra are normalized with respect to the Raman peak.

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Enhancing NV concentration in delta-doped diamond via low-pressure high-temperature annealing

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